PVD V201-8 hard coating equipment

Main technical parameters and configuration of PVD V201-8 hard coating equipment:

1. Vacuum chamber volume: φ 1000*1200mm；       

2. Effective coating area: φ 700*850mm；

3. Removable turret: it can be moved out at any position without positioning, and the transmission is reliable (patented technology);

4. Cathode arc: φ 160mm double drive dynamic magnetron cathode arc * 8;

5. IET ion etching source.

Technical features:

This series adopts the dynamic double drive magnetically controlled cathode arc technology, with high ionization rate. Single layer or multilayer films such as TiN, CrN, TiAlN, AlTiN, AlCrN, AlCrSiN can be prepared. High efficiency pre coating ion etching technology ensures the adhesion and performance of the coating. This series of equipment does not need to lay the bottom layer (transition layer) in the coating process, and directly forms the film, with high deposition efficiency.